The Resource Characterization of multi temperature and multi RF chuck power grown silicon nitride films by PECVD and ICP vapor deposiiton, F. Semedy ... [et al.], (electronic resource)

Characterization of multi temperature and multi RF chuck power grown silicon nitride films by PECVD and ICP vapor deposiiton, F. Semedy ... [et al.], (electronic resource)

Label
Characterization of multi temperature and multi RF chuck power grown silicon nitride films by PECVD and ICP vapor deposiiton
Title
Characterization of multi temperature and multi RF chuck power grown silicon nitride films by PECVD and ICP vapor deposiiton
Statement of responsibility
F. Semedy ... [et al.]
Title variation
Characterization of multi temperature and multi RF chuck power grown silicon nitride films by plasma enhanced chemical vapor deposition and inductive coupled plasma vapor deposition
Creator
Contributor
Subject
Language
eng
Member of
Cataloging source
GPO
http://library.link/vocab/creatorName
Semendy, Fred
Government publication
federal national government publication
Illustrations
illustrations
Index
no index present
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
  • technical reports
http://library.link/vocab/relatedWorkOrContributorName
U.S. Army Research Laboratory
Series statement
ARL-TR
Series volume
5105
http://library.link/vocab/subjectName
  • Silicon nitride
  • Chemical vapor deposition
Target audience
adult
Label
Characterization of multi temperature and multi RF chuck power grown silicon nitride films by PECVD and ICP vapor deposiiton, F. Semedy ... [et al.], (electronic resource)
Link
http://purl.access.gpo.gov/GPO/LPS124986
Instantiates
Publication
Note
  • Title from PDF title screen (viewed on Aug. 6, 2010)
  • "March 2010."
Bibliography note
Includes bibliographical references (p. 11)
Color
multicolored
Control code
653261363
Dimensions
unknown
Extent
1 online resource (vi, 14 p.)
Form of item
online
Other physical details
col. ill.
Specific material designation
remote
Label
Characterization of multi temperature and multi RF chuck power grown silicon nitride films by PECVD and ICP vapor deposiiton, F. Semedy ... [et al.], (electronic resource)
Link
http://purl.access.gpo.gov/GPO/LPS124986
Publication
Note
  • Title from PDF title screen (viewed on Aug. 6, 2010)
  • "March 2010."
Bibliography note
Includes bibliographical references (p. 11)
Color
multicolored
Control code
653261363
Dimensions
unknown
Extent
1 online resource (vi, 14 p.)
Form of item
online
Other physical details
col. ill.
Specific material designation
remote

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